About Photomask
Photomasks are high-purity quartz or glass plates that contain a pattern of ICs. These are used in the reproduction of pattern structures for manufacturing printed circuit boards, electronic circuits, and LCD displays, and for the serial production of reticles and other microstructures.
Photomasks are used at wavelengths of 365 nm, 248 nm, and 193 nm. ICs are manufactured layer by layer, where each layer requires a unique photomask. As current generation ICs typically have 25-60 layers, the manufacturing process of photomasks has become complex. As a result, EUV wavelengths of 13.5 nm are used for complex photomask manufacturing.
Technavio's analysts forecast the global photomask market to grow at a CAGR of 2.37% during the period 2016-2020.
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Covered in this report
The report covers the present scenario and the growth prospects of the global photomask market for the period 2016-2020. To calculate the market size, the report considers the revenue generated from sales of photomasks.
The market is divided into the following segments based on geography:
APAC
Americas
EMEA
Technavio's report, Global Photomask Market 2016-2020, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.
Key vendors
Dai Nippon
Toppan Photomasks
Photronics
Other prominent vendros
Compugraphics Photomask Solutions
Hoya
SK Electronics
Taiwan Mask
Nippon Filcon
HTA Photomask
PKL
Plasma Therm
Mycronic
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Table of Contents
PART 01: Executive summary
Highlights
PART 02: Scope of the report
Market overview
Product offerings
PART 03: Market research methodology
Research...